| 摘要 |
PROBLEM TO BE SOLVED: To obtain a variable rectangular electron beam exposure apparatus capable of highly finely conducting exposure with respect to a predetermined fine line pattern having an arbitrary angle in the pattern region. SOLUTION: The variable rectangular electron beam exposure apparatus forms rectangular beams 31, 32 of different angles and is equipped with: a first slit member 10 in which a plurality of rectangular apertures 11, 12 are arranged by different angles, respectively; a second slit member 20 in which a plurality of rectangular apertures 21, 22 respectively positioned in parallel with the corresponding rectangular apertures of the first slit member are arranged; and a deflecting member 40 to deflect an electron beam which has been transmitted through a plurality of apertures of the first slit member so that when the electron beam transmitted through one aperture of the first slit member is transmitted through the corresponding aperture of the second slit member, the electron beam transmitted through the other aperture is intercepted. COPYRIGHT: (C)2006,JPO&NCIPI
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