发明名称 |
Small volume process chamber with hot inner surfaces |
摘要 |
A system and method of processing a substrate including loading a substrate into a plasma chamber and setting a pressure of the plasma chamber to a pre-determined pressure set point. Several inner surfaces that define a plasma zone are heated to a processing temperature of greater than about 200 degrees C. A process gas is injected into the plasma zone to form a plasma and the substrate is processed.
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申请公布号 |
US2006105575(A1) |
申请公布日期 |
2006.05.18 |
申请号 |
US20050303210 |
申请日期 |
2005.12.15 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
BAILEY ANDREW D.III;NI TUQIANG |
分类号 |
H01L21/461;H01J37/32;H01L21/00;H01L21/302;H01L21/321;H01L21/3213;H01L21/44;H01L21/4763;H01L21/683;H01L21/768;H01L23/48;H01L23/52;H01L29/24;H01L29/40;H01L33/00 |
主分类号 |
H01L21/461 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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