发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM CONTAINING THE SAME
摘要 A photosensitive resin composition which gives a dry film having a sand blast proof property and a development property in a well-balanced manner. A photosensitive resin composition containing a carboxy group-containing urethane (meth)acrylate compound having two or more of (meth)acryloyl groups per molecule whose acid value of less than 10 mg KOH/g, an alkali soluble polymer compound, a photopolymerization initiator and a photopolymerizable compound (D) including in the structure thereof a structural unit represented by the formula (I) gives such a well-balanced properties. <?in-line-formulae description="In-line Formulae" end="lead"?><img id="PRIVATE-USE-CHARACTER-00001" he="7.20mm" wi="8.47mm" file="US07402376-20080722-Parenopenst.TIF" alt="private use character Parenopenst" img-content="character" img-format="tif" />OCH<SUB>2</SUB>CH<SUB>2</SUB><img id="PRIVATE-USE-CHARACTER-00002" he="7.20mm" wi="8.47mm" file="US07402376-20080722-Parenclosest.TIF" alt="private use character Parenclosest" img-content="character" img-format="tif" /> (I)<?in-line-formulae description="In-line Formulae" end="tail"?>
申请公布号 KR20060049155(A) 申请公布日期 2006.05.18
申请号 KR20050034676 申请日期 2005.04.26
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 NAKAZATO SYUNJI;MIZUSAWA RYUMA;OBIYA HIROYUKI;ONO TAKASHI;FUJITO YUSUKE
分类号 G03F7/027;C08F290/06;G03C1/492;G03F7/004 主分类号 G03F7/027
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