发明名称 EXPOSURE METHOD AND APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To prevent such problems wherein a photosensitive layer can not be removed or a photoresist layer easily peels, while keeping the adhesiveness of a photosensitive layer when a recording medium, such as a printed wiring board having a photosensitive layer with sensitivity with respect to light, such as a resist layer deposited thereon is exposed to light for transferring a pattern. <P>SOLUTION: When a resist layer formed on a substrate is exposed to transfer a wiring pattern by an exposure apparatus 3, the irradiation energy of light irradiating an edge area of the wiring pattern is controlled to be higher than the irradiation energy of light irradiating other regions, other than the edge region. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006126463(A) 申请公布日期 2006.05.18
申请号 JP20040314047 申请日期 2004.10.28
申请人 FUJI PHOTO FILM CO LTD 发明人 SASAKI YOSHIHARU
分类号 G03F7/20;H05K3/00 主分类号 G03F7/20
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