| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a reactive organic thin film easily causing photoreaction using a general exposing apparatus in which a dense monomolecular film having small impurities is rapidly formed and a solution for forming the organic thin film using the forming method. SOLUTION: The method of forming the organic thin film comprises a process for bringing the solution for forming the organic thin film into contact with the surface of a base material, and the solution for forming the organic thin film is obtained by treating a photosensitive compound having a functional group containing a hetero atom with at least one kind selected from a metal, a metal oxide, a metallic salt, a metallic hydroxide, metallic alkoxides, a chelated or coordinated metallic compound, a hydrolyzed product obtained by treating the metallic alkoxides with water and an acid and water in an organic solvent. COPYRIGHT: (C)2006,JPO&NCIPI
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