DEVICE FOR THE VAPOUR DEPOSITION OF A COATING MATERIAL

摘要

The invention relates to a device for the vapour deposition of a coating material on a substrate. Said device comprises a container (125) with a vapour outlet opening (127) that is configured to direct vapour onto the substrate in a vapour direction and a vaporisation source (143), which is located inside the container and is configured to deposit a coating material held in a container by vaporisation in the source direction. The container comprises a lower and an upper region, the vaporisation source being located in the lower region and not in the upper region and the vapour outlet opening being located in the upper region and not the lower region. The container comprises a lateral wall and an upper and lower cover, the lateral wall extending continuously from the upper cover to the lower cover. The vapour outlet opening is configured in the upper region of the lateral wall in such a way that the vapour is emitted in the vapour direction, which differs from the source direction.