| 摘要 |
<P>PROBLEM TO BE SOLVED: To decrease shrinkage in wiring and to decrease influences of defocus. <P>SOLUTION: The exposure mask has a wiring pattern 102 and a dummy pattern 104 disposed at a predetermined distance α from an edge in the longitudinal direction of the wiring pattern 102. The edge position in the longitudinal direction of the wiring pattern 102 from which the dummy pattern 104 is disposed at a predetermined distance α is coincident with a position in another exposure mask where a via pattern is disposed. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
