| 摘要 |
A method and structure for providing adjustable optical lithography illumination comprises a blade which can be customized to provide a desired light pattern. The adjustable blade can be selectively configured to optimize a light pattern during development of a photolithographic process, then the optimized pattern can be transferred to a diffractive optical element or other light shaping means for production. Descriptions and depictions of specific adjustable blades are provided.
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