发明名称 METHOD AND APPARATUS FOR MEASURING RETENTION DISTORTION
摘要 <p><P>PROBLEM TO BE SOLVED: To enable a retention distortion to be measured in addition to shapes of a face to be tested, which occurs in a plate-like object to be tested such as a photomask or the like, due to its retention state, when retaining the object to be tested in a prescribed retention state. <P>SOLUTION: Measurements are carried out, which comprises; a first measurement of measuring a shape of the first surface 41 of the object to be tested 40 which is retained in the prescribed retention state; a second measurement of measuring a shape of the second surface 42 of the object to be tested 40 which is retained in the same state; and a third measurement of measuring a shape of the second surface 42 of the object to be tested 40 which is retained such that a reverse distortion occurs therein. Then, first data are obtained on the basis of a first-surface shape data set produced by the first measurement and a second-surface shape data set produced by the second measurement, and second data are obtained on the basis of the first-surface shape data set produced by the first measurement and a second-surface shape data set produced by the third measurement. The retention distortion is computed, based on these first and second data. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006126082(A) 申请公布日期 2006.05.18
申请号 JP20040316788 申请日期 2004.10.29
申请人 FUJINON CORP;ASAHI GLASS CO LTD 发明人 UEKI NOBUAKI;OTSUKA KOJI
分类号 G01B21/32;G01B11/16 主分类号 G01B21/32
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