VERTICAL BOAT FOR HEAT TREATMENT AND HEAT TREATING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vertical boat for heat treatment capable of effectively preventing a slip from being generated in a wafer and the like in the heat treatment even in the case of heat treatment at an extremely high temperature of 1,200°C or more, and capable of manufacturing the wafer having the surface layer with high productivity and quality, and to provide a method for the heat treatment. SOLUTION: A vertical boat 8 for heat treatment carries-in or carries-out at least a plurality of wafer-state bodies to be treated by supporting them with a gap in an up-and-down direction by a support column having support surfaces. The underside of wafer-state the body to be treated is supported by a plurality of the support surfaces 4 formed at the support column. The flatness of a face formed of the plurality of support faces that contact with the same body to be treated is not more than 0.03 mm, and the parallelism thereof is not more than 0.07 mm. COPYRIGHT: (C)2006,JPO&NCIPI