发明名称 SYSTEM AND METHOD FOR MEASURING CAPACITY
摘要 PROBLEM TO BE SOLVED: To provide capacity measuring system/method with which capacity can highly precisely be measured where a rear face of a wafer is set to be one electrode. SOLUTION: The capacity measuring system is provided with a stage 10 where the wafer 1 is placed and fixed and with a tester 20. The system measures capacity 3 where the rear face of the wafer is formed as one electrode. The stage is provided with a conductive chuck 11, an electric shielding member 14 which is disposed below the chuck and is insulated from a periphery, and a back plate 13 supporting the conductive chuck 11 and the electric shielding member 14. The tester is provided with a first measurement terminal to which a probe is connected, a base measurement terminal 24 connected to the conductive chuck and a measurement ground terminal 27 connecting the electric shielding member to measurement ground. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006128351(A) 申请公布日期 2006.05.18
申请号 JP20040313730 申请日期 2004.10.28
申请人 TOKYO SEIMITSU CO LTD 发明人 TABAYASHI MASATOSHI
分类号 H01L21/66 主分类号 H01L21/66
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