发明名称 SEMICONDUCTOR LASER APPARATUS AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor laser apparatus which has a high impurity concentration in the interface of a p-type clad layer and an active region layer. SOLUTION: In the semiconductor laser apparatus, the concentration distribution of a p-type impurity in an active region 18 in contact with a low impurity concentration layer 20a of the first p-type clad layer 20 and the high impurity concentration layer 20b of the first p-type clad layer is flat in average by a value between 7×10<SP>17</SP>cm<SP>-3</SP>and 1.1×10<SP>18</SP>cm<SP>-3</SP>in a high impurity concentration layer 20b of the first p-type clad layer. The p-type impurity concentration exists between 8×10<SP>17</SP>cm<SP>-3</SP>and 1.1×10<SP>18</SP>cm<SP>-3</SP>in the interface of the first p-type clad layer 20 and the active region layer 18, and the p-type impurity concentration is lowered to 5×10<SP>17</SP>cm<SP>-3</SP>within 50 nm from the interface of the first p-type clad layer 20 and the active region layer 18 in the active region layer 18 in contact with the first p-type clad layer 20. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006128151(A) 申请公布日期 2006.05.18
申请号 JP20040310309 申请日期 2004.10.26
申请人 MITSUBISHI ELECTRIC CORP 发明人 ONO KENICHI;YOSHIDA YASUAKI
分类号 H01S5/343 主分类号 H01S5/343
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