发明名称 Prozess und Zusammensetzung für Rückstandentfernung von der Mikrostruktur eines Objekts
摘要 A process for removing residues from the microstructure of an object is provided, which comprises steps of preparing a remover including carbon dioxide, an additive for removing the residues and a co-solvent dissolving the additive in said carbon dioxide at a pressurized fluid condition; andbringing the object into contact with the remover so as to remove the residues from the object. A composition for removing residues from the microstructure of an object is also provided.
申请公布号 DE60304389(D1) 申请公布日期 2006.05.18
申请号 DE2003604389 申请日期 2003.05.22
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO, KOBE 发明人 MASUDA, KAORU;IIJIMA, KATSUYUKI;YOSHIKAWA, TETSUYA;PETERS, DARRY W.
分类号 H01L21/00;B08B7/00;C11D7/26;C11D7/30;C11D7/32;C11D7/50;C11D7/60;C11D11/00;G03F7/42;H01L21/027;H01L21/304 主分类号 H01L21/00
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