发明名称 CRYSTAL GROWTH METHOD OF GROUP III NITRIDE, GROUP III NITRIDE CRYSTAL AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a crystal growth method of a group-III nitride, by which a high-quality and large-size group-III nitride crystal can be manufactured at a lower cost than heretofore. SOLUTION: In the crystal growth method of the group-III nitride, comprising growing the group-III nitride crystal from a melt 24 wherein at least an alkali metal, a raw material of a group III metal, and nitrogen are dissolved, the group III nitride crystal 27 having a growth surface of (000-1) plane is grown from an area which is generally covered with the (0001) plane or the ä10-11} plane of the group III nitride 26 or a plane where the (0001) plane and the ä10-11} plane coexist. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006124224(A) 申请公布日期 2006.05.18
申请号 JP20040313692 申请日期 2004.10.28
申请人 RICOH CO LTD 发明人 IWATA HIROKAZU;SARAYAMA SHOJI
分类号 C30B29/38;C30B11/06 主分类号 C30B29/38
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