发明名称 |
ALIGNMENT METHOD AND DEVICE, EXPOSURE METHOD AND DEVICE, METHOD FOR MANUFACTURING THERMAL HEAD, THERMAL HEAD, AND PRINTING DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique to align a substrate having glaze to a photomask with high accuracy. <P>SOLUTION: The alignment method for a mask and a substrate includes a first focusing step of focusing to an alignment mark 31 disposed on a photomask 30, a recording step of recording image data, a second focusing step of focusing to a substrate 11, and a superposing step of superposing the image data recorded in the recording step while keeping the substrate 11 as focused. An alignment detecting system 22 is moved by R/2 in the second focusing step. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006126381(A) |
申请公布日期 |
2006.05.18 |
申请号 |
JP20040313141 |
申请日期 |
2004.10.27 |
申请人 |
TDK CORP |
发明人 |
UCHIDA KAZUHITO |
分类号 |
G03F9/00;B41J2/335;B41J2/345 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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