发明名称 ALIGNMENT METHOD AND DEVICE, EXPOSURE METHOD AND DEVICE, METHOD FOR MANUFACTURING THERMAL HEAD, THERMAL HEAD, AND PRINTING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a technique to align a substrate having glaze to a photomask with high accuracy. <P>SOLUTION: The alignment method for a mask and a substrate includes a first focusing step of focusing to an alignment mark 31 disposed on a photomask 30, a recording step of recording image data, a second focusing step of focusing to a substrate 11, and a superposing step of superposing the image data recorded in the recording step while keeping the substrate 11 as focused. An alignment detecting system 22 is moved by R/2 in the second focusing step. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006126381(A) 申请公布日期 2006.05.18
申请号 JP20040313141 申请日期 2004.10.27
申请人 TDK CORP 发明人 UCHIDA KAZUHITO
分类号 G03F9/00;B41J2/335;B41J2/345 主分类号 G03F9/00
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