| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a stencil mask that enables splicing together high precision sub patterns in a divided projection system, and to provide an exposure method using the same. <P>SOLUTION: The stencil mask comprises a thin film, and grid-shape beam members for supporting the thin film. The thin film is divided into a plurality of sub pattern forming regions by the grid-shape beam members. On each sub pattern forming region, sub patterns are formed in which transfer patterns are divided. At least one part of regions adjacent to the sub pattern forming region is removed where the grid-shape beam members are formed. Alignment marks are formed on a region of the thin film which is exposed the removed part. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
