METHOD FOR ETCHING MESA ISOLATION IN ANTIMONY BASED COMPOUND SEMICONDUCTOR STRUCTURES

摘要

Antimony-based semiconductor devices are formed over a substrate structure (10) that includes an antimony-based buffer layer (24) and an antimony-based buffer cap (26). Multiple epitaxial layers (30-42) formed over the substrate structure (10) are dry etched to form device mesas (12) and the buffer cap (26) provides a desirably smooth mesa floor and electrical isolation around the mesas.