COMPOSITION FOR PHOTORESIST PROTECTIVE FILM, PHOTORESIST PROTECTIVE FILM AND PHOTORESIST PATTERN FORMATION PROCESS

摘要

A composition for a photoresist protective film comprising a fluoropolymer having at least one functional group selected from the group consisting of -COOH, -SO 3 H, -OP(=O)(OH) 2 , -NR 2 and -N + R 3 Cl - (wherein R represents a C 1-4 alkyl group) and having a weight average molecular weight Mw of from 1,000 to 100,000 and a solvent.