ORGANOIRIDIUM COMPOUND, PROCESS FOR PRODUCING THE SAME, AND PROCESS FOR PRODUCING FILM

摘要

An organometallic iridium compound having low melting point, excellent vaporization characteristic and low film formation temperature on a substrate, a process for producing the compound, and a process for preparing iridium-containing films using the organometallic compound are provided. The organometallic iridium compound represented by the formula (1)
(example of specific compound: (ethylcyclopentadienyl)bis(ethylene)iridium) is obtained by reacting a compound represented by the formula (4)
with a compound represented by the formula (2) or (3)
An iridium-containing film is prepared using the compound as a precursor.
In the formulae, R 1 represents hydrogen atom or a lower alkyl group; R 2 represents a lower alkyl group; X represents a halogen atom; and M represents an alkali metal.