发明名称 A multi-sided-channel finfet transistor and manufacturing method
摘要 <p>An at least penta-sided-channel type of FinFET transistor may include: a base; a semiconductor body formed on the base, the body being arranged in a long dimension to have source/drain regions sandwiching a channel region, at least the channel, in cross-section transverse to the long dimension, having at least five planar surfaces above the base; a gate insulator on the channel region of the body; and a gate electrode formed on the gate insulator. </p>
申请公布号 EP1555688(A3) 申请公布日期 2006.05.17
申请号 EP20050000303 申请日期 2005.01.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 RHEE, HWA-SUNG;UENO, TETSUJI;YOO, JAE-YOON;LEE, HO;LEE, SEUNG-HWAN;KIM, HYUN-SUK;PARK, MOON-HAN
分类号 H01L21/336;H01L29/786 主分类号 H01L21/336
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