| 摘要 |
<p>An arrangement of irradiation regions (61) which correspond to micromirros of a DMD is tilted relatively to an arrangement of writing cells (620). Writing of a pattern is performed by relative movement of a irradiation region group to a writing cell group in a main scanning direction. A center-to-center distance along a sub-scanning direction between two adjacent irradiation regions (61) arranged almost in the main scanning direction is made equal to a writing pitch of writing cells (620), and a center-to-center distance along main scanning direction between them is made "a times" the writing pitch. ON/OFF control of light irradiation is performed once during relative movement of the irradiation region group by a distance equal to "n times" the writing pitch (n is an integer larger than 2). Appropriate pattern writing with high resolution at a high speed is realized where(a2+1) and n are relatively prime.</p> |
