| 摘要 |
PROBLEM TO BE SOLVED: To provide a phenol novolak resin excellent in sensitivity, resolution and focal depth-width property when fine overcrowded or isolated pattern is formed, and a positivetype photoeresist composition. SOLUTION: A phenol novolak resin having the following: peak strength ratios of o-o/o-p/p-p bonds are 3.0-5.0/2.0-3.5/1, respectively; they make no change in each molecular weight region; and the resin has a phenolic constituting unit shown by the following formula and has a Mw of 3,000-20,000. |
