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发明名称
RINSING COMPOSITION, AND METHOD FOR RINSING AND MANUFACTURING SILCON WAFER
摘要
申请公布号
KR20060046463(A)
申请公布日期
2006.05.17
申请号
KR20050051731
申请日期
2005.06.16
申请人
FUJIMI INCORPORATED
发明人
NAKAGAWA HIROYUKI
分类号
G03F7/32;C11D3/37;C11D7/32;C11D11/00
主分类号
G03F7/32
代理机构
代理人
主权项
地址
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