发明名称 |
Method for metallizing insulating substrates wherein the roughening and etching processes are controlled by means of gloss measurement |
摘要 |
The invention relates to a control of etching processes of insulating substrates by means of gloss measurement. By this method a surface roughness can be achieved which leads to good adhesion of metals layers deposited in subsequent metallization steps. This method is particularly suited for the production of printed circuit boards. |
申请公布号 |
EP1657324(A1) |
申请公布日期 |
2006.05.17 |
申请号 |
EP20040026653 |
申请日期 |
2004.11.10 |
申请人 |
ATOTECH DEUTSCHLAND GMBH |
发明人 |
PIEL, MERTEN, DIPL.-ING.;STAMP, LUTZ;MOEPERT, CHRISTIANE |
分类号 |
C23C18/22;H05K3/00;H05K3/38 |
主分类号 |
C23C18/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|