发明名称 |
Displacement correction apparatus, exposure system, exposure method and a computer program product |
摘要 |
An exposure system includes, (a) an exposure apparatus, and (b) a displacement correction apparatus having a curvature information storage unit configured to store curvature information of a reticle; a displacement information calculation unit configured to calculate displacement generated in the reticle being fixed on a reticle stage of an exposure apparatus based on the curvature information; and a correction information calculation unit configured to calculate correction information for correcting a projection lens of the exposure apparatus based on the displacement.
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申请公布号 |
US7046334(B2) |
申请公布日期 |
2006.05.16 |
申请号 |
US20040808300 |
申请日期 |
2004.03.25 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
KONO TAKUYA;HIGASHIKI TATSUHIKO |
分类号 |
G03B27/42;G03B27/52;G03B27/58;G03B27/62;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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