发明名称 |
Self-aligned vertical gate semiconductor device |
摘要 |
A transistor ( 10 ) is formed in a semiconductor substrate ( 12 ) whose top surface ( 48 ) is formed with a pedestal structure ( 24 ). A conductive material ( 40 ) is disposed along a side surface ( 28 ) of the pedestal structure to self-align an edge of a first conduction electrode ( 45 ) of the transistor. A dielectric spacer ( 55 ) is formed along a side surface ( 49 ) of the conductive material to self-align a contact area ( 56 ) of the first conduction electrode.
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申请公布号 |
US7045845(B2) |
申请公布日期 |
2006.05.16 |
申请号 |
US20020219190 |
申请日期 |
2002.08.16 |
申请人 |
SEMICONDUCTOR COMPONENTS INDUSTRIES, L.L.C. |
发明人 |
GRIVNA GORDON M. |
分类号 |
H01L27/108;H01L21/28;H01L21/331;H01L21/336;H01L29/06;H01L29/423;H01L29/732;H01L29/78 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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