发明名称 SEMICONDUCTOR DEVICE, AND METHOD AND APPARATUS FOR MANUFACTURING THE SAME
摘要 A semiconductor device having a semiconductor film formed on a substrate, characterized in that the semiconductor film has laterally grown crystal, and at an end portion of the laterally grown crystal, height of surface projection is lower than film thickness of said semiconductor film, is provided.
申请公布号 KR20060044508(A) 申请公布日期 2006.05.16
申请号 KR20050023409 申请日期 2005.03.22
申请人 SHARP KABUSHIKI KAISHA 发明人 KASHIWAGI IKUMI;NAKAYAMA JUNICHIRO
分类号 H01L21/20;C30B13/24;C30B29/06;H01L21/268;H01L21/336;H01L21/428;H01L21/84;H01L29/04 主分类号 H01L21/20
代理机构 代理人
主权项
地址