| 发明名称 |
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD USING THE SAME |
| 摘要 |
<p>A positive resist composition for immersion exposure comprises: (A) a resin containing at least one repeating unit having a fluorine atom and increasing a solubility of the resin in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and radiation.</p> |
| 申请公布号 |
KR20060044338(A) |
申请公布日期 |
2006.05.16 |
| 申请号 |
KR20050020839 |
申请日期 |
2005.03.14 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
INABE HARUKI;KANNA SHINICHI;KANDA HIROMI |
| 分类号 |
G03F7/004;G03F7/00;G03F7/039;G03F7/20 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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