发明名称 Method of manufacturing a field emission device utilizing the sacrificial layer
摘要 A substrate, a cathode electrode formed on the substrate, a gate insulating layer which is formed on the cathode electrode and has a through hole corresponding to part of the cathode electrode, a gate electrode which has a gate hole corresponding to the through hole and is formed on the gate insulating layer, and an emitter formed on the gate electrode exposed to the bottom of the through hole. The emitter has a stack structure formed of a resistive material layer and an electron emission material layer containing a fine electron emission source formed on the resistive material layer.
申请公布号 US7044822(B2) 申请公布日期 2006.05.16
申请号 US20030735741 申请日期 2003.12.16
申请人 SAMSUNG SDI CO., LTD. 发明人 LEE JEONG-HEE;LEE HANG-WOO;PARK SHANG-HYEUN;KIM YOU-JONG
分类号 H01J9/04;H01J1/304;H01J9/02 主分类号 H01J9/04
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