SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD FOR THE SAME

摘要

The present invention provides a semiconductor memory device including: a semiconductor substrate (100) of a first conductivity type; and a memory cell including: (i) a columnar semiconductor portion (110) formed on the substrate (100), (ii) at least two charge-storage layers (300) formed around a periphery of the columnar semiconductor portion (110) and divided in a direction vertical to the semiconductor substrate (100), and (iii) a control gate (500) that covers at least a portion of charge-storage layers (300), wherein the memory cell is capable of holding two-bit or more data.