发明名称 |
Chemical vapor deposition reactor |
摘要 |
A chemical vapor deposition reactor has a rotatable wafer carrier which cooperates with a chamber of the reactor to facilitate laminar flow of reaction gas within the chamber. The chemical vapor deposition reactor can be used in the fabrication of LEDs and the like. |
申请公布号 |
GB2419896(A) |
申请公布日期 |
2006.05.10 |
申请号 |
GB20060002942 |
申请日期 |
2004.06.29 |
申请人 |
ELITE OPTOELECTRONICS, INC. |
发明人 |
HENG LIU |
分类号 |
H01L21/00;C23C16/00;C23C16/44;C23C16/455;C23C16/458;C30B25/14;C30B29/40 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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