Method Of Patterning Interlayer Dielectric And Semiconductor Device Fabricated By Using The Method,申请号KR20030020174-传众专利搜索

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发明名称	Method Of Patterning Interlayer Dielectric And Semiconductor Device Fabricated By Using The Method
摘要
申请公布号	KR100578125(B1)	申请公布日期	2006.05.10
申请号	KR20030020174	申请日期	2003.03.31
申请人		发明人
分类号	H01L21/306	主分类号	H01L21/306
代理机构		代理人
主权项
地址

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