发明名称 METHOD FOR CUTTING OF SUBSTRATE USING FEMTOSECOND LASER
摘要 <p>A method for cutting a substrate is disclosed which uses a femtosecond laser capable of preventing thermal expansion and generation of shock waves from occurring around a region where a cutting process is carried out when the femtosecond laser is used to cut the substrate, thereby being capable of achieving a reduction in costs. The method includes the steps of arranging the substrate on a stage, and irradiating a femtosecond laser to a predetermined portion of the substrate arranged on the stage, thereby cutting the substrate along the predetermined substrate portion.</p>
申请公布号 KR20060040277(A) 申请公布日期 2006.05.10
申请号 KR20040089702 申请日期 2004.11.05
申请人 LG.PHILIPS LCD CO., LTD. 发明人 PARK, JEONG KWEON
分类号 G02F1/13 主分类号 G02F1/13
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