FLUOROCOPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME

摘要

A fluoropolymer which has functional groups and is highly transparent in a wide wavelength region; and a resist composition containing the fluoropolymer. The fluorocopolymer comprises: units derived from a fluorinated diene represented by the following formula (1) and formed by the cyclopolymerization of the monomer; and units derived from other monomer(s) and formed by the cyclopolymerization thereof or units derived from an acrylic monomer and formed by the polymerization thereof. The resist composition contains the fluorocopolymer as a base polymer. CF 2=CFCH2CH(CH2C(CF3)2(OR1))CH2CH=CH2 (1) In the formula, R1 is hydrogen, C20 or lower alkyl optionally having etheric oxygen, C6 or lower alkoxycarbonyl, or CH2R2 (wherein R2 is C6 or lower alkoxycarbonyl).