发明名称 SILICON CRYSTALLIZATION USING SELF-ASSEMBLED MONOLAYERS
摘要 A display device comprises a substrate having a layer of crystalline or polycrystalline semiconductor material disposed over the substrate, wherein the substrate has a strain point that is lower than a forming temperature of the layer. The crystalline or polycrystalline material is fabricated by a method that includes providing a self-assembled monolayer (SAM) over the substrate, depositing a layer of material over the SAM, and substantially crystallizing the layer.
申请公布号 KR20060040694(A) 申请公布日期 2006.05.10
申请号 KR20067001221 申请日期 2006.01.18
申请人 CORNING INCORPORATED 发明人 COUILLARD JAMES G;HANCOCK ROBERT R. JR.;LEWIS MARK A
分类号 H01L21/20;C03C17/34;C03C17/42;C23C16/02;C30B25/02;C30B25/18;H01L21/205 主分类号 H01L21/20
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