发明名称 Projection optical system, exposure apparatus, and device manufacturing method
摘要 A projection optical system for projecting an image of a first object onto a second object includes a first imaging optical system that forms a first intermediate image of the first object, and includes a lens, a second imaging optical system that forms a second intermediate image of the first object, and includes a lens and a concave mirror, and a third imaging optical system that forms an image of the first object onto the second object, and includes a lens, wherein the first, second and third imaging optical systems are arranged along an optical path from the first object in this order, and 0.7 < |²1 · ²2| < 3.0 is met where ²1 is a paraxial magnification of the first imaging optical system, and ²2 is a paraxial magnification of the second imaging optical system.
申请公布号 EP1480065(A3) 申请公布日期 2006.05.10
申请号 EP20040012075 申请日期 2004.05.21
申请人 CANON KABUSHIKI KAISHA 发明人 KATO, TAKASHI;TERASAWA CHIAKI
分类号 G02B17/00;G02B13/14;G02B17/08;G03F7/20 主分类号 G02B17/00
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