发明名称 High voltage tolerant ESD design for analog and RF applications in deep submicron CMOS technologies
摘要 The invention describes structures and a process for providing ESD semiconductor protection with reduced input capacitance that has special advantages for high frequency analog pin I/O applications. The structures consist of a first and second NMOS serial pair whose capacitance is shielded from the I/O pins by a serial diode. The first serial pair provides an ESD voltage clamp between the I/O pin and the Vcc voltage source. The second pair provides an ESD voltage clamp between the I/O pin and Vss, or ground voltage source. A NMOS device whose gate is dynamically coupled to the ESD energy through capacitance and a RC network enhances the triggering of both pairs. The serial pairs can be used separately to match specific application requirements or used together.
申请公布号 US7042689(B2) 申请公布日期 2006.05.09
申请号 US20030348388 申请日期 2003.01.21
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN CHUNG-HUI
分类号 H02H9/00;H01L21/8234;H01L21/8244;H01L27/02 主分类号 H02H9/00
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