发明名称 |
High voltage tolerant ESD design for analog and RF applications in deep submicron CMOS technologies |
摘要 |
The invention describes structures and a process for providing ESD semiconductor protection with reduced input capacitance that has special advantages for high frequency analog pin I/O applications. The structures consist of a first and second NMOS serial pair whose capacitance is shielded from the I/O pins by a serial diode. The first serial pair provides an ESD voltage clamp between the I/O pin and the Vcc voltage source. The second pair provides an ESD voltage clamp between the I/O pin and Vss, or ground voltage source. A NMOS device whose gate is dynamically coupled to the ESD energy through capacitance and a RC network enhances the triggering of both pairs. The serial pairs can be used separately to match specific application requirements or used together.
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申请公布号 |
US7042689(B2) |
申请公布日期 |
2006.05.09 |
申请号 |
US20030348388 |
申请日期 |
2003.01.21 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHEN CHUNG-HUI |
分类号 |
H02H9/00;H01L21/8234;H01L21/8244;H01L27/02 |
主分类号 |
H02H9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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