发明名称 Positioning stage device
摘要 A high speed, wide-range, high-accuracy positioning stage device for eliminating errors due to deterministic elements such as variation of surface machining accuracy of a bar mirror and for preventing error accumulation due to indeterminate elements such as air fluctuations when switching between laser interferometers. When an X1 laser interferometer as a first position measurement device and an X2 laser interferometer as a second position measurement device are switched, at a place at which at least two position measurement devices are activated, when a value is handed over from the X1 laser interferometer, which was activated, to the X2 laser interferometer, which is to be activated, errors due to the effect of X-bar mirror flatness and air fluctuations are found by a correction function for the X-bar mirror and/or a table and the average of the measured values, and the value of the X2 laser interferometer is corrected by a correction device such as a calculation device.
申请公布号 US7042576(B2) 申请公布日期 2006.05.09
申请号 US20030349108 申请日期 2003.01.23
申请人 CANON KABUSHIKI KAISHA 发明人 HATTORI TADASHI
分类号 G01B11/00;G01B11/02;G01B9/02;G01B21/00;G03F7/20;G03F9/00;H01L21/027;H01L21/68 主分类号 G01B11/00
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