发明名称 Polishing media stabilizer
摘要 A polishing apparatus that employs a polishing media retention arrangement to prevent slippage or wrinkles in the polishing media during polishing. The polishing media is drawn against a support surface by a vacuum applied between the polishing media and the support surface. Also, a porous layer may be placed between the polishing media and the support surface to form dimples in the polishing media upon the application of vacuum. An alternative arrangement draws the polishing media against a carrier and the substrate to be polished.
申请公布号 US7040964(B2) 申请公布日期 2006.05.09
申请号 US20020262164 申请日期 2002.10.01
申请人 APPLIED MATERIALS, INC. 发明人 SOMMER PHILLIP R.;BUTTERFIELD PAUL D.
分类号 B24B1/00;B24B37/00;B24B37/04;H01L21/302;H01L21/304;H01L21/306 主分类号 B24B1/00
代理机构 代理人
主权项
地址