| 发明名称 |
Device manufacturing method and computer program |
| 摘要 |
System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z 5 astigmatism, Z 9 spherical, and Z 12 astigmatism.
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| 申请公布号 |
US7042550(B2) |
申请公布日期 |
2006.05.09 |
| 申请号 |
US20030716939 |
申请日期 |
2003.11.20 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOWISCH MARTIN;DIERICHS MARCEL MATHIJS THEODORE MARIE;VAN INGEN SCHENAU KOEN;VAN DER LAAN HANS;LEENDERS MARTINUS HENDRIKUS ANTONIUS;MCCOO ELAINE;MICKAN UWE |
| 分类号 |
G03B27/42;G03B27/32;G03F1/00;G03F1/14;G03F1/24;G03F7/20;G03F7/22;G03F9/02;H01L21/027 |
主分类号 |
G03B27/42 |
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代理人 |
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