发明名称 |
Enhancement of fabrication yields of nanomechanical devices by thin film deposition |
摘要 |
A protective film is applied onto a nanostructural feature supported on a sacrificial layer by energy beam assisted deposit of material from a vapor through which the beam passes. A wet etchant is applied to etch away the sacrificial layer beneath the nanostructural feature to leave it suspended as a cantilever or bridge. The film protects the structural feature from damage during etching, and may be removed after the wet etching process is completed.
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申请公布号 |
US7041611(B2) |
申请公布日期 |
2006.05.09 |
申请号 |
US20040802259 |
申请日期 |
2004.03.17 |
申请人 |
WISCONSIN ALUMNI RESEARCH FOUNDATION |
发明人 |
BLICK ROBERT H.;KOENIG DANIEL R. |
分类号 |
H01L21/00;H02P9/04 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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