发明名称 Method of aligning a substrate, a computer program, a device manufacturing method and a device manufactured thereby
摘要 While the alignment beam is focused on a mark on the substrate table, the substrate table is moved substantially perpendicularly to the alignment beam. If the image of the mark moves relative to a reference mark, then the substrate and the alignment beam are not perpendicular. The mark on the substrate table is aligned to a plurality of reference marks. At least two substrate marks are then aligned with a single reference mark. Errors due to the inclination of the alignment beam are eliminated from the expansion and rotation values calculated for the substrate.
申请公布号 US7041996(B2) 申请公布日期 2006.05.09
申请号 US20030659714 申请日期 2003.09.11
申请人 ASML NETHERLANDS B.V. 发明人 BEST KEITH FRANK;CONSOLINI JOSEPH;FRIZ ALEXANDER;VAN BUEL HENRICUS WILHELMUS MARIA
分类号 G01B11/00;G01N21/86;G01B11/26;G03F9/00;H01L21/027 主分类号 G01B11/00
代理机构 代理人
主权项
地址