发明名称 |
Method of aligning a substrate, a computer program, a device manufacturing method and a device manufactured thereby |
摘要 |
While the alignment beam is focused on a mark on the substrate table, the substrate table is moved substantially perpendicularly to the alignment beam. If the image of the mark moves relative to a reference mark, then the substrate and the alignment beam are not perpendicular. The mark on the substrate table is aligned to a plurality of reference marks. At least two substrate marks are then aligned with a single reference mark. Errors due to the inclination of the alignment beam are eliminated from the expansion and rotation values calculated for the substrate.
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申请公布号 |
US7041996(B2) |
申请公布日期 |
2006.05.09 |
申请号 |
US20030659714 |
申请日期 |
2003.09.11 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BEST KEITH FRANK;CONSOLINI JOSEPH;FRIZ ALEXANDER;VAN BUEL HENRICUS WILHELMUS MARIA |
分类号 |
G01B11/00;G01N21/86;G01B11/26;G03F9/00;H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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