发明名称 Device and method for determining an edge coverage during coating processes
摘要 In a method for determining an edge coverage during coating processes a substrate is provided, a mask layer is deposited on the substrate, at least one through hole is formed in the mask layer and at least one first trench-type depression is formed in the substrate by patterning the substrate and the mask layer. An expanded second trench-type depression which extends in a direction parallel to the surface of the substrate is obtained by expanding isotropically the first trench-type depression. The second trench-type depression comprises a lateral trench opening at at least one lateral end region so that a coating material can penetrate laterally into the second trench-type depression through the trench opening.
申请公布号 US2006094233(A1) 申请公布日期 2006.05.04
申请号 US20050256300 申请日期 2005.10.21
申请人 GUTSCHE MARTIN;SEIDL HARALD 发明人 GUTSCHE MARTIN;SEIDL HARALD
分类号 H01L21/4763 主分类号 H01L21/4763
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