发明名称 |
Device and method for determining an edge coverage during coating processes |
摘要 |
In a method for determining an edge coverage during coating processes a substrate is provided, a mask layer is deposited on the substrate, at least one through hole is formed in the mask layer and at least one first trench-type depression is formed in the substrate by patterning the substrate and the mask layer. An expanded second trench-type depression which extends in a direction parallel to the surface of the substrate is obtained by expanding isotropically the first trench-type depression. The second trench-type depression comprises a lateral trench opening at at least one lateral end region so that a coating material can penetrate laterally into the second trench-type depression through the trench opening.
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申请公布号 |
US2006094233(A1) |
申请公布日期 |
2006.05.04 |
申请号 |
US20050256300 |
申请日期 |
2005.10.21 |
申请人 |
GUTSCHE MARTIN;SEIDL HARALD |
发明人 |
GUTSCHE MARTIN;SEIDL HARALD |
分类号 |
H01L21/4763 |
主分类号 |
H01L21/4763 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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