发明名称 Semiconductor device having enhanced breakdown voltage
摘要 A semiconductor device has: a main circuit including a plurality of MOS transistors operating at a first voltage; a memory requiring an operation at a second voltage higher than the first voltage; and a drive circuit for driving the memory, the drive circuit comprising one well, two or more MOS transistors in a cascade connection formed in the well, and well contact or contacts formed between MOS transistors in the well and on both outer sides of the cascade connection, or formed only between MOS transistors, or formed on both outer sides of the cascade connection, or formed only outside a drain of MOS transistors in the cascade connection. The semiconductor device is provided which integrates a memory requiring a high voltage, can simplify manufacture processes for a memory drive circuit and suppress an increase in an occupation area in chip of the memory drive circuit.
申请公布号 US2006092700(A1) 申请公布日期 2006.05.04
申请号 US20050061475 申请日期 2005.02.22
申请人 FUJITSU LIMITED 发明人 WATANABE TAKETO
分类号 G11C16/04 主分类号 G11C16/04
代理机构 代理人
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