发明名称 Beschichtungszusammensetzung für die Filmherstellung, Verfahren zur Filmherstellung und Silica-Filme
摘要 <p>A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one silane compound selected from the group consisting of compounds represented by the formula (1), compounds represented by the formula (2), and compounds represented by the formula (3) in the presence of water and at least one compound selected from the group consisting of tetraalkylammonium hydoxides, alicyclic organic amines, and metal hydroxides, and (B) an organic solvent.</p>
申请公布号 DE60117631(D1) 申请公布日期 2006.05.04
申请号 DE2001617631 申请日期 2001.04.09
申请人 JSR CORP. 发明人 HAYASHI, EIJI;HASEGAWA, KOUICHI;YOUNGSOO, SEO
分类号 C08G77/08;C08G77/50;C09D183/02;C09D183/04;C09D183/14;H01L21/312 主分类号 C08G77/08
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