CONTROLLED VAPOR DEPOSITION OF MULTILAYERED COATINGS ADHERED BY AN OXIDE LAYER

摘要

An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate (106) is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer.