| 摘要 |
It is the aim of this invention to provide a system and a method to achieve periodic and quasi-periodic patterns with periods in the 5-100 nm range in a cost effective way. Of course, the system has also general applicability to patterns periods outside this range. This aim is achieved by the present invention which discloses a system for generating periodic and/or quasi-periodic pattern on a sample by using an interference lithography technique; the system comprising: a) a photon source; b) a mask having a periodic or quasi-periodic pattern that corresponds to the desired pattern; said mask being disposed at a first distance from the photon source or after intermediate optical elements such as collimators, collectors, mirrors, lenses, filters and apertures; c) a sample holder for holding the sample being disposed in a second distance from the mask on the side opposite to the photon source, thereby the second distance is chosen to be in a range where the intensity distribution is substantially stationary and distance-invariant or the second distance is varied to obtain a desired average intensity distribution on the sample surface. |
