OPTICAL LENS ELEMENTS, SEMICONDUCTOR LITHOGRAPHIC PATTERNING APPARATUS, AND METHODS FOR PROCESSING SEMICONDUCTOR DEVICES

摘要

An optical lens element is disclosed, formed of single crystal spinel material, the optical element having an optical transmittance of not less than 75%. Also, a lithographic patterning apparatus is disclosed, including a radiation source and a mask having a pattern arranged downstream of the radiation source, the mask receiving radiation to provide a patterned beam. Further, a projection optic having multiple optical lens elements, at least one of which is comprised of single crystal spinel material, and a substrate table for receiving the substrate is provided. In addition, methods for processing semiconductor devices are disclosed.