发明名称 |
Generating nano-particles for chemical mechanical planarization |
摘要 |
An embodiment of the present invention is a technique to generate particles for use in a slurry solution for chemical mechanical planarization (CMP). Reverse micelles are formed using at least one of an oxide and a metal in a mixture. The size of the reverse micelles is tuned to a desired size. The particles are formed inside the reverse micelles. The particles are precipitated and transferred to a slurry solution.
|
申请公布号 |
US2006090692(A1) |
申请公布日期 |
2006.05.04 |
申请号 |
US20040976593 |
申请日期 |
2004.10.29 |
申请人 |
DOMINGUEZ JUAN E;FLANIGAN KYLE Y;NIU BAOHUA;PUTNA ERNISSE |
发明人 |
DOMINGUEZ JUAN E.;FLANIGAN KYLE Y.;NIU BAOHUA;PUTNA ERNISSE |
分类号 |
C30B15/14;C30B23/00;C30B25/00;C30B28/12;C30B28/14 |
主分类号 |
C30B15/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|