发明名称 |
Alignment systems and methods for lithographic systems |
摘要 |
An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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申请公布号 |
US2006091330(A1) |
申请公布日期 |
2006.05.04 |
申请号 |
US20050294476 |
申请日期 |
2005.12.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN BILSEN FRANCISCUS B.M.;BURGHOORN JACOBUS;VAN HAREN RICHARD JOHANNES F.;HINNEN PAUL C.;VAN HORSSEN HERMANUS G.;HUIJBREGTSE JEROEN;JEUNINK ANDRE B.;MEGENS HENRY;KOREN RAMON N.Y.;TOLSMA HOITE PIETER T.;SIMONS HUBERTUS JOHANNES G.;SCHUURHUIS JOHNY R.;SCHETS SICCO I.;LEE BRIAN Y.B.;DUNBAR ALLAN R. |
分类号 |
G01B11/00;G01N21/86;G01B11/02;G01B21/00;G02B5/18;G03F7/00;G03F7/20;G03F9/00;G03F9/02;H01L21/027;H01L21/3205;H01L21/68;H01L23/52;H01S3/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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